Semiconductor Nanofabrication and Nano-analytical Methods

The module focuses on various methods of nanofabrication (optical, electron beam lithography, focused ion beam) and newer emerging techni¬ques (x-ray lithography, nanoimprint, etc.). In particular the physical principles are discussed and limitations for the various methods given. Various synthesis and crystal growth methods for advanced semiconductor nanostructures will be further introduced such as chemical and physical vapor phase epitaxial techniques (MOVPE, MBE, etc.) and the physical growth principles of 0D,1D, and 2D materials highlighted. Examples will be given where these low-dimensional nanostructures are implemented into cutting-edge technological applications. The second part of this lecture deals with specific nanoanalytical methods required for characterization of structural, surface and atomic properties of nanofabricated and synthesized materials. These include electron microscopy, surface analytical methods, ion beam analytical techniques, x-ray techniques, and some new sophisticated techniques, such as atom probe tomography, etc.

After successful completing of the module students are able to:

• to select and evaluate specific nanofabrication methods relevant for nanotechnological applications
• understand the limits of the various methodologies
• understand nanofabrication and analysis of mainly semiconductor-based devices
• perform structural, atomic and interface specific analysis of nanostructured materials
• understand the complex interplay between material synthesis, structural and electronic properties of materials, and their effect on functionalities in cutting-edge device applications

Basics in Solid State Physics (e.g. PH0019)

This module consists of a lecture and an exercise class.

In the thematically structured lecture the learning content is presented. With cross references between different topics the universal concepts in nanotechnology and -analytics are shown. In scientific discussions the students are involved to stimulate their analytic-physics intellectual power.

In the exercise the learning content is deepened and exercised via individual lab projects. Thus the students are able to explain and apply the learned methodologies independently.

Class-room Presentation (slide - powerpoint), Lab visit

• Z. Cui: Nanofabrication: Principles, Capabilities and Limits, Springer, (2008)
• M. A. Herman, W. Richter & H. Sitter: Epitaxy: Physical Principles and Technical Implementation, Springer, (2004)
• V. A. Shchukin, N. N. Ledentsov & D. Bimberg: Epitaxy of Nanostructures, Springer, (2010)
• E. Fuchs, H. Oppolzer & H. Rehme: Particle Beam Microanalysis: Fundamentals, Methods and Applications, Wiley-VCH, (1990)

The examination will take the form of a 25-minute oral exam. Students have to demonstrate that they are able to assess semiconductor-based manufacturing techniques and analytical methods in nanotechnology. By answering comprehension questions, they must demonstrate their knowledge of the relationships between the physical properties of the respective methods, the defined limits and application areas in material production and the structural and electronic properties of different material systems.