Semiconductor Nanofabrication and Nano-analytical Methods
Module version of SS 2014
There are historic module descriptions of this module. A module description is valid until replaced by a newer one.
Whether the module’s courses are offered during a specific semester is listed in the section Courses, Learning and Teaching Methods and Literature below.
|available module versions
PH2183 is a semester module in German or English language at Master’s level which is offered in winter semester.
This module description is valid from SS 2014 to SS 2019.
If not stated otherwise for export to a non-physics program the student workload is given in the following table.
Responsible coordinator of the module PH2183 in the version of SS 2014 was Gregor Koblmüller.
Content, Learning Outcome and Preconditions
The module focuses on various methods of nanofabrication (optical, electron beam lithography, focused ion beam) and newer emerging techni¬ques (x-ray lithography, nanoimprint, etc.). In particular the physical principles are discussed and limitations for the various methods given. Various synthesis and crystal growth methods for advanced semiconductor nanostructures will be further introduced such as chemical and physical vapor phase epitaxial techniques (MOVPE, MBE, etc.) and the physical growth principles of 0D,1D, and 2D materials highlighted. Examples will be given where these low-dimensional nanostructures are implemented into cutting-edge technological applications. The second part of this lecture deals with specific nanoanalytical methods required for characterization of structural, surface and atomic properties of nanofabricated and synthesized materials. These include electron microscopy, surface analytical methods, ion beam analytical techniques, x-ray techniques, and some new sophisticated techniques, such as atom probe tomography, etc.
After successful completing of the module students are able to:
- to select and evaluate specific nanofabrication methods relevant for nanotechnological applications
- understand the limits of the various methodologies
- understand nanofabrication and analysis of mainly semiconductor-based devices
- perform structural, atomic and interface specific analysis of nanostructured materials
- understand the complex interplay between material synthesis, structural and electronic properties of materials, and their effect on functionalities in cutting-edge device applications
Basics in Solid State Physics (e.g. PH0019)
Courses, Learning and Teaching Methods and Literature
Learning and Teaching Methods
This module consists of a lecture and an exercise class.
In the thematically structured lecture the learning content is presented. With cross references between different topics the universal concepts in nanotechnology and -analytics are shown. In scientific discussions the students are involved to stimulate their analytic-physics intellectual power.
In the exercise the learning content is deepened and exercised via individual lab projects. Thus the students are able to explain and apply the learned methodologies independently.
Class-room Presentation (slide - powerpoint), Lab visit
- Z. Cui: Nanofabrication: Principles, Capabilities and Limits, Springer, (2008)
- M. A. Herman, W. Richter & H. Sitter: Epitaxy: Physical Principles and Technical Implementation, Springer, (2004)
- V. A. Shchukin, N. N. Ledentsov & D. Bimberg: Epitaxy of Nanostructures, Springer, (2010)
- E. Fuchs, H. Oppolzer & H. Rehme: Particle Beam Microanalysis: Fundamentals, Methods and Applications, Wiley-VCH, (1990)
Description of exams and course work
The examination will take the form of a 25-minute oral exam. Students have to demonstrate that they are able to assess semiconductor-based manufacturing techniques and analytical methods in nanotechnology. By answering comprehension questions, they must demonstrate their knowledge of the relationships between the physical properties of the respective methods, the defined limits and application areas in material production and the structural and electronic properties of different material systems.
The exam may be repeated at the end of the semester.