Introduction to Nanofabrication and Nanoanalytics

The module focuses on various methods of nanofabrication (optical, electron beam lithography, focused ion beam) and newer emerging techniques (x-ray lithography, nanoimprint, etc.). In particular the physical principles are discussed and limitations for each method given. Various synthesis and crystal growth methods for advanced semiconductor nanostructures will be further introduced such as chemical and physical vapor phase epitaxial techniques (MOVPE, MBE, etc.) and the growth of 0D,1D, and 2D materials highlighted. The second part of this module deals with specific nanoanalytical methods required for characterization of structural, surface and atomic properties of nanofabricated and synthesized materials. These include electron microscopy, surface analytical methods, ion beam analytical techniques, x-ray techniques, and some new sophisticated techniques.

The goal of the module is to provide the basic material science and applied physics background for the various nanofabrication and nanoanalytical methods offered in our institute.

1. Nanofabrication (Principles, Capabilities and Limits), Zheng Cui, Springer 2008
2. Epitaxy of Nanostructures, V.A. Shchukin, N.N. Ledentsov, D. Bimberg, Springer 2003
3. Particle Beam Microanalysis (Fundamentals, Methods, and Applications), E. Fuchs, H. Oppolzer, H. Rehme, VCH 1990
4. Handbook of Instrumentation and Techniques for Semiconductor Nanostructure Characterization, R. Haight, F. M. Ross, J. B. Hannon, World Scientific 2012

In an oral exam the learning outcome is tested using comprehension questions and sample problems.

In accordance with §12 (8) APSO the exam can be done as a written test. In this case the time duration is 60 minutes.