Advances in Atomic Layer Deposition and Etching for M.Sc. Students

Module PH1540

This module handbook serves to describe contents, learning outcome, methods and examination type as well as linking to current dates for courses and module examination in the respective sections.

Module version of WS 2022/3 (current)

There are historic module descriptions of this module. A module description is valid until replaced by a newer one.

Whether the module’s courses are offered during a specific semester is listed in the section Courses, Learning and Teaching Methods and Literature below.

available module versions
WS 2022/3	WS 2021/2

Basic Information

PH1540 is a semester module in language at which is offered irregularly.

This Module is included in the following catalogues within the study programs in physics.

Catalogue of student seminars for condensed matter physics
Catalogue of student seminars for Applied and Engineering Physics

If not stated otherwise for export to a non-physics program the student workload is given in the following table.

Total workload	Contact hours	Credits (ECTS)
120 h	60 h	4 CP

Responsible coordinator of the module PH1540 is Ian Sharp.

Content, Learning Outcome and Preconditions

Content

This seminar will provide students with the opportunity to give presentations on recent topics in the field of atomic layer deposition (ALD) and atomic layer etching (ALE). Special foci will be on use of ALD and ALE for modern nanomaterial and nanodevice fabrication, with applications including advanced optoelectronics, energy harvesting and storage, and catalysis; control of physical properties of materials deposited by ALD; interfacial reaction mechanisms and in situ process monitoring; and emerging trends and advanced variants of ALD and ALE processes.

Learning Outcome

After successful participation in the module the students can:

Use and critically evaluate basic methods of literature retrieval,
Condense their knowledge from scientific papers into a presentation and obtain presentation skills,
Acquire additional knowledge about recent topics in the field of atomic layer deposition and atomic layer etching.

Preconditions

No preconditions required.

Courses, Learning and Teaching Methods and Literature

Courses and Schedule

WS 2022/3 SS 2022 WS 2021/2

Type	SWS	Title	Lecturer(s)	Dates	Links
PS	2	Advances in Atomic Layer Deposition and Etching	Sharp, I.	dates in groups	eLearning
RE	2	Revision Course to Advances in Atomic Layer Deposition and Etching	Responsible/Coordination: Sharp, I.

Learning and Teaching Methods

Active and passive participation in scientific presentations and the associated discussion.

Media

Power point presentations and open discussions.

Literature

To be determined individually.

Module Exam

Description of exams and course work

In the course of the seminar each student individually prepares a talk on a topic of current research. Based on this talk the learning outcome is tested.