Advances in Atomic Layer Deposition and Etching for M.Sc. Students
Module version of WS 2022/3 (current)
There are historic module descriptions of this module. A module description is valid until replaced by a newer one.
Whether the module’s courses are offered during a specific semester is listed in the section Courses, Learning and Teaching Methods and Literature below.
|available module versions
PH1540 is a semester module in language at which is offered irregularly.
This Module is included in the following catalogues within the study programs in physics.
- Catalogue of student seminars for condensed matter physics
- Catalogue of student seminars for Applied and Engineering Physics
If not stated otherwise for export to a non-physics program the student workload is given in the following table.
Responsible coordinator of the module PH1540 is Ian Sharp.
Content, Learning Outcome and Preconditions
This seminar will provide students with the opportunity to give presentations on recent topics in the field of atomic layer deposition (ALD) and atomic layer etching (ALE). Special foci will be on use of ALD and ALE for modern nanomaterial and nanodevice fabrication, with applications including advanced optoelectronics, energy harvesting and storage, and catalysis; control of physical properties of materials deposited by ALD; interfacial reaction mechanisms and in situ process monitoring; and emerging trends and advanced variants of ALD and ALE processes.
After successful participation in the module the students can:
- Use and critically evaluate basic methods of literature retrieval,
- Condense their knowledge from scientific papers into a presentation and obtain presentation skills,
- Acquire additional knowledge about recent topics in the field of atomic layer deposition and atomic layer etching.
No preconditions required.
Courses, Learning and Teaching Methods and Literature
Courses and Schedule
|Advances in Atomic Layer Deposition and Etching
|dates in groups
|Revision Course to Advances in Atomic Layer Deposition and Etching
Responsible/Coordination: Sharp, I.