Advances in Atomic Layer Deposition and Etching for B.Sc. Students
PH1539 is a semester module in language at which is offered irregularly.
This Module is included in the following catalogues within the study programs in physics.
- Catalogue of student seminars for the Bachelor's programme Physics
If not stated otherwise for export to a non-physics program the student workload is given in the following table.
|Total workload||Contact hours||Credits (ECTS)|
|120 h||60 h||4 CP|
Responsible coordinator of the module PH1539 is Ian Sharp.
Content, Learning Outcome and Preconditions
This seminar will provide students with the opportunity to give presentations on recent topics in the field of atomic layer deposition (ALD) and atomic layer etching (ALE). Special foci will be on use of ALD and ALE for modern nanomaterial and nanodevice fabrication, with applications including advanced optoelectronics, energy harvesting and storage, and catalysis; control of physical properties of materials deposited by ALD; interfacial reaction mechanisms and in situ process monitoring; and emerging trends and advanced variants of ALD and ALE processes.
After successful participation in the module the students can:
- Use and critically evaluate basic methods of literature retrieval,
- Condense their knowledge from scientific papers into a presentation and obtain presentation skills,
- Acquire additional knowledge about recent topics in the field of atomic layer deposition and atomic layer etching.
No preconditions required.
Courses, Learning and Teaching Methods and Literature
Courses and Schedule
|PS||2||Advances in Atomic Layer Deposition and Etching||
Assistants: Henning, A.
Tue, 14:00–16:00, WSI S402
|RE||2||Revision Course to Advances in Atomic Layer Deposition and Etching||
Responsible/Coordination: Sharp, I.